1. System introduction

The wafer surface defect optical test system is developed based on the self-developed four-wave shear sensor, which can realize the rapid monitoring of surface defects of wafer samples, and has the characteristics of high resolution (horizontal resolution up to micron level, high resolution up to nanometer level), non-contact measurement, and large measurement dynamic range.

2. System composition

The optical test system for wafer surface defects is mainly composed of a light source, an inspection opto-mechanical system, a detector, etc., and the principle demonstration prototype is shown in the figure below.

Prototype of the principle of the optical test system for wafer surface defects

Wafer samples and fixtures